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Wet etching
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| Post Date: | Dec 04,2009 |
| Expiry Date: | Dec 04,2010 |
| Detailed Description: | Cas No. : Wet etching The first etching processes used liquid-phase ("wet") etchants. The wafer can be immersed in a bath of etchant, which must be agitated to achieve good process control. For instance, buffered hydrofluoric acid (BHF) is used commonly to etch silicon dioxide over a silicon substrate. Different specialised etchants can be used to characterise the surface etched. Wet etchants are usually isotropic, which leads to large bias when etching thick films. They also require the disposal of large amounts of toxic waste. For these reasons, they are seldom used in state-of-the-art processes. However, the photographic developer used for photoresist resembles wet etching. As an alternative to immersion, single wafer machines use the Bernoulli principle to employ a gas (usually, pure nitrogen) to cushion and protect one side of the wafer while etchant is applied to the other side. It can be done to either the front side or back side. The etch chemistry is dispensed on the top side when in the machine and the bottom side is not affected. This etch method is particularly effective just before "backend" processing (BEOL), where wafers are normally very much thinner after wafer backgrinding, and very sensitive to thermal or mechanical stress. Etching a thin layer of even a few micrometres will remove microcracks produced during backgrinding resulting in a the wafer having dramatically increased strength and flexibility without breaking Seeking coorparation with overseas semiconductor equipments manufacturers Our company is one professional manufacturer of semiconductor equipment in China, now we are searching for overseas excellent semiconductor equipment manufacturers,material enteprise and equipment parts manufacturers to cooperate.With the world ecnomic globalizing,it is not impossible for one company to monopolize highest technology and market in any field in any country, increasing global collaboration is the gold key to developing technology and expanding world market,seeking overseas topping partners to achieve win-win cooperation is one strategic plan of our company now and will continue.List company’s brief introduction,cooperation fields,cooperation modes,cooperation advantages and benefits as follows: Brief introduction: Suzhou CSE Semiconductor Equipment Technology Co., Ltd., is a joint- stock enterprise invested by CAS Suzhou Institute of Nano-tech and Nano-bionics and Beijing HL Co., our major products are semiconductor equipments, solar photovoltaic equipments, LCD cleaning facilities, vacuum equipments and etc.; Depending on the high-tech R&D team of CAS Suzhou Institute of Nano-tech and Nano-bionics and HL’s skillful experience in related industries together, we occupied the middle market of semiconductor equipment rapidly and have owned steady and loyal customer groups. In inner semiconductor equipments field, we cooperated with country research institutes and entered 8” wafer market firstly as one of the earliest and largest manufaturers. Cooperation fields: Semiconductor equipments and parts manufacturer; Solar photovoltaic equipments and parts manufacturer; LCD cleaning facilities and parts manufacturer; Semiconductor material enteprise; Others related companies; Cooperation modes: Technology cooperation; OEM; Providing sales and after sales sevice; Agency; Cooperation advantages: Professional skills in technology,producing and after sales; Professional sales experiences and steady customer groups; Topping professors of Suzhou Nano- tech institute as our partner; Vigorous support from Suzhou government; Advantaged geographical position; Cooperation benefits: Provide excellent and high cost performance products and service; Assist foreign companies entering China market; |
| Company: | Suzhou CSE Semiconductor Equipment Technology Co., Ltd. |
| Contact: | Amy Chang |
| Tel: | +86-18913168552 |
| Fax: | +86-18913168552 |
| Email: | Send Message |
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