Plasma etching

• Post Date:

  Dec 04,2009

• Expiry Date:

  Dec 04,2010

• Detailed Description:

  Modern VLSI processes avoid wet
  etching, and use plasma etching
  instead. Plasma etchers can
  operate in several modes by
  adjusting the parameters of the
  plasma. Ordinary plasma etching
  operates between 0.1 and 5 torr.
  (This unit of pressure, commonly
  used in vacuum engineering, equals
  approximately 133.3 pascals.) The
  plasma produces energetic free
  radicals, neutrally charged, that
  react at the surface of the wafer.
  Since neutral particles attack the
  wafer from all angles, this
  process is isotropic.
  The source gas for the plasma
  usually contains small molecules
  rich in chlorine or fluorine. For
  instance, carbon tetrachloride
  (CCl4) etches silicon and
  aluminium, and trifluoromethane
  etches silicon dioxide and silicon
  nitride. A plasma containing
  oxygen is used to oxidize ("ash")
  photoresist and facilitate its
  removal.
  Ion milling, or sputter etching,
  uses lower pressures, often as low
  as 10-4 torr (10 mPa). It bombards
  the wafer with energetic ions of
  noble gases, often Ar+, which
  knock atoms from the substrate by
  transferring momentum. Because the
  etching is performed by ions,
  which approach the wafer
  approximately from one direction,
  this process is highly
  anisotropic. On the other hand, it
  tends to display poor selectivity.
  Reactive-ion etching (RIE)
  operates under conditions
  intermediate between sputter and
  plasma etching (between 10-3 and
  10-1 torr). Deep reactive-ion
  etching (DRIE) modifies the RIE
  technique to produce deep, narrow
  features.
  Common etch processes used in
  microfabrication
  Seeking coorparation with overseas
  semiconductor equipments
  manufacturers
  
  Our company is one professional
  manufacturer of semiconductor
  equipment in China, now we are
  searching for overseas excellent
  semiconductor equipment
  manufacturers,material enteprise
  and equipment parts manufacturers
  to cooperate.With the world
  ecnomic globalizing,it is not
  impossible for one company to
  monopolize highest technology and
  market in any field in any
  country, increasing global
  collaboration is the gold key to
  developing technology and
  expanding world market,seeking
  overseas topping partners to
  achieve win-win cooperation is one
  strategic plan of our company now
  and will continue.List company’s
  brief introduction,cooperation
  fields,cooperation
  modes,cooperation advantages and
  benefits as follows:
  
  Brief introduction:
  Suzhou CSE Semiconductor Equipment
  Technology Co., Ltd., is a joint-
  stock enterprise invested by CAS
  Suzhou Institute of Nano-tech and
  Nano-bionics and Beijing HL Co.,
  our major products are
  semiconductor equipments, solar
  photovoltaic equipments, LCD
  cleaning facilities, vacuum
  equipments and etc.; Depending on
  the high-tech R&D team of CAS
  Suzhou Institute of Nano-tech and
  Nano-bionics and HL’s skillful
  experience in related industries
  together, we occupied the middle
  market of semiconductor equipment
  rapidly and have owned steady and
  loyal customer groups.
  In inner semiconductor equipments
  field, we cooperated with country
  research institutes and entered
  8” wafer market firstly as one of
  the earliest and largest
  manufaturers.
  
  Cooperation fields:
  Semiconductor equipments and parts
  manufacturer;
  Solar photovoltaic equipments and
  parts manufacturer;
  LCD cleaning facilities and parts
  manufacturer;
  Semiconductor material enteprise;
  Others related companies;
  
  Cooperation modes:
  Technology cooperation;
  OEM;
  Providing sales and after sales
  sevice;
  Agency;
  
  Cooperation advantages:
  Professional skills in
  technology,producing and after
  sales;
  Professional sales experiences and
  steady customer groups;
  Topping professors of Suzhou Nano-
  tech institute as our partner;
  Vigorous support from Suzhou
  government;
  Advantaged geographical position;
  
  Cooperation benefits:
  Provide excellent and high cost
  performance products and service;
  Assist foreign companies entering
  China market;
  

• Company:

  Suzhou CSE Semiconductor Equipment Technology Co., Ltd.     [ China ]        

• Contact:

  Amy Chang

• Tel:

  +86-18913168552

• Fax:

  +86-18913168552

• Email:

  amychangcse@yahoo.com