1,3-Hexafluorobutadiene - ( C4F6 )
| Post Date: |
Sep 10,2015 |
| Expiry Date: |
Sep 09,2016 |
| Detailed Description: |
Cas No. :685-63-2
This is a next gereration core material required to minimize circuit line widths and depths in LSI production processes . This dry etching gas is used to micro contact hole etching processes . For any specialty gas based on a CxFy Formula , the less the fraction F/C becomes, the more CF2 radicals are generated . As the fraction is lower for C4F6 than for C2F6 and C3F8 , more CF2 radicals are generated , which , in turn, etches oxide films . Therefore , C4F6 has a higher selectivity for oxide films and allows for more even etching . |
| CAS Registry Number: |
|
| Synonyms: |
;Hexafluoro-1,3-butadiene;1,1,2,3,4,4-hexafluorobuta-1,3-diene;Perfluorobuta-1,3-diene; |
| Molecular Formula: |
C4F6 |
| Molecular Weight: |
162.0332 |
| Molecular Structure: |
|
| Risk Codes: |
R11:Highly flammable.;
|
| Safety Description: |
S16:Keep away from sources of ignition - No smoking.;
S23:Do not inhale gas/fumes/vapour/spray.;
S33:Take precautionary measures against static discharges.;
|
| Company: |
Shanghai Wechem Chemical Co., Ltd
[ China ]
|
| Contact: |
Tony Guo |
| Tel: |
+86-21-51987501 |
| Fax: |
+86-21-61927501 |
| Email: |
info@wechem.cn |
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