disilane
Inquiry
| Post Date: | Jul 20,2021 |
| Expiry Date: | Jul 20,2022 |
| Detailed Description: |
Cas No. :1590-87-0
For solar cells, photosensitive rotating cylinder, amorphous silicon film, epitaxial growth, oxide film, nitride film, chemical vapor deposition, etc.In the production of solar cells, the deposition rate of ethylsilane on amorphous silicon wafer is much faster than that of silane, and the temperature can be reduced by 200 ~ 300℃.In ion implantation, ethylsilane as ion source is easy to glow and has strong beam current, and the effect is better than other gases as ion source.
It is used in the epitaxy and diffusion process in the semiconductor process, as well as in solar cells and photosensitive drums for electronic photography. |
| CAS Registry Number: | 1590-87-0 |
| Synonyms: | Disilane |
| Molecular Formula: | H6Si2 |
| Molecular Weight: | 62.2186 |
| Molecular Structure: | 
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| Company: | Quanjiao Argotech electronic new material technology Co., Ltd [ China ] |
| Contact: | Murphy Song |
| Tel: | +8613913851441 |
| Fax: | |
| Email: | murphysong@argotechs.com.cn |
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