1,3-Hexafluorobutadiene - ( C4F6 )

• Post Date:

  Sep 10,2015

• Expiry Date:

  Sep 09,2016

• Detailed Description:

  Cas No. :685-63-2 This is a next gereration core material required to minimize circuit line widths and depths in LSI production processes . This dry etching gas is used to micro contact hole etching processes . For any specialty gas based on a CxFy Formula , the less the fraction F/C becomes, the more CF2 radicals are generated . As the fraction is lower for C4F6 than for C2F6 and C3F8 , more CF2 radicals are generated , which , in turn, etches oxide films . Therefore , C4F6 has a higher selectivity for oxide films and allows for more even etching .

• CAS Registry Number:

  685-63-2

• Synonyms:

  ;Hexafluoro-1,3-butadiene;1,1,2,3,4,4-hexafluorobuta-1,3-diene;Perfluorobuta-1,3-diene;

• Molecular Formula:

  C₄F₆

• Molecular Weight:

  162.0332

• Molecular Structure:

  

• Risk Codes:

  R11:Highly flammable.;
  

• Safety Description:

  S16:Keep away from sources of ignition - No smoking.;
  S23:Do not inhale gas/fumes/vapour/spray.;
  S33:Take precautionary measures against static discharges.;
  

• Company:

  Shanghai Wechem Chemical Co., Ltd     [ China ]        

• Contact:

  Tony Guo

• Tel:

  +86-21-51987501

• Fax:

  +86-21-61927501

• Email:

  info@wechem.cn