Hexafluoroethane gas C2F6

• Post Date:

  Feb 24,2014

• Expiry Date:

  Aug 23,2014

• Detailed Description:

  Cas No. :76-16-4 Payment Method: T/T, L/C
  Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon. The solar panel manufacturing industry is one of the major emitters of hexafluoroethane, which has a greenhouse gas potential 12,000 times greater than CO2.
  Together with trifluoromethane it is used in refrigerants R508A (61%) and R508B (54%).
  

• CAS Registry Number:

  76-16-4

• Synonyms:

  ;FC-116;Perfluoroethane;R116;

• Molecular Formula:

  C₂F₆

• Molecular Weight:

  138.0118

• Molecular Structure:

  

• Company:

  Central China Special Gas Co., Ltd.     [ China ]        

• Contact:

  Kelvin Den

• Tel:

  0734-8755678

• Fax:

  0734-8755678

• Email:

  den@ccsg.cn