Tetrafluoromethane (CF4)

• Post Date:

  Feb 24,2014

• Expiry Date:

  Aug 23,2014

• Detailed Description:

  Cas No. :75-73-0 Payment Method: T/T, L/C
  Tetrafluoromethane is the usage biggest as plasma etching technique gas in the micro-electronics industrial , its tall purely gas and the mixed gas(high-purity Tetrafluoromethane mixed with the high-purity oxygen), can extensively be applied to silicon, silicon dioxide, silicon nitride, phosphorosilicate glass and the etching technique of tungsten thin - film material. At electron spare part surface cleaning, the manufacture of solar cell, laser technique, gaseous insulation, low temperature system air - cooling, leakage inspection agent, control cosmos rocket carriage, the detergent in the printed circuit also in great quantities used.
  Tetrafluoromethane the dissolving of oxygen good, therefore be used for by the scientist super - depth to dive experiment to replace common compressed air.
  In medicine, it also can be used tomake narcotics.
  

• CAS Registry Number:

  75-73-0

• Synonyms:

  ;Tetrafluoromethane;

• Molecular Formula:

  CF₄

• Molecular Weight:

  88

• Molecular Structure:

  

• Safety Description:

  S38:;
  

• Company:

  Central China Special Gas Co., Ltd.     [ China ]        

• Contact:

  Kelvin Den

• Tel:

  0734-8755678

• Fax:

  0734-8755678

• Email:

  den@ccsg.cn