| Futurrex was founded in 1985 with the objective to develop products that enhance productivity in the microelectronics, optoelectronics and graphic arts industries. To achieve this objective, Futurrex created innovative, application-specific coatings for photolithography, device surface planarization and device doping.
Futurrex offers products in the following categories:
negative resists
positive resists
edge bead removers
resist developers
resist removers
planarizing coatings
spin-on glasses
spin-on dopants
Futurrex抯 products deliver scalable solutions to inadequate photoresist processes, are capable of achieving surface planarity without resorting to Chemical Mechanical Polishing (CMP) and provide solutions for doping processes for III-V semiconductor devices.
The unique advantage of Futurrex抯 resist approach is that both positive and negative photoresists are processed with the same metal-ion free, water-based developer and the same resist remover. Such approach reduces chemical handling and simplifies photolithographic process. Futurrex抯 coatings benefit customers by increasing product throughput and by boosting device yield.
The success of Futurrex products is best evidenced by a rapidly expanding and diversified customer base. From Fortune 500 firms to small businesses, Futurrex has grown into a multinational company focusing on developing solutions for customers' fabrication needs.
|
Search Product